Mentor Graphics Joins Chartered NanoAccess Alliance and Delivers Comprehensive Support for 90nm Technology

WILSONVILLE, Ore. & SINGAPORE--(BUSINESS WIRE)--Sept. 18, 2003--Mentor Graphics Corporation (Nasdaq:MENT) and Chartered Semiconductor Manufacturing (Nasdaq:CHRT)(SGX-ST: CHARTERED), today announced that Mentor has joined the Chartered NanoAccess(TM) Alliance. Mentor Graphics and Chartered are collaborating to provide extensive design support for 90-nanometer (nm) system-on-chip (SoC) manufacturing technologies from Chartered, one of the world's top three dedicated semiconductor foundries. The companies are jointly developing 90nm technology files and models for Calibre DRC(TM), Calibre LVS(TM) and Calibre xRC(TM) that exploit the most advanced physical verification, parasitic extraction and resolution enhancement capabilities of the Calibre(R) design-to-silicon platform, which is Chartered's "golden" internal standard for design rule checking (DRC).

"The Calibre design-to-silicon platform has a long track record of silicon success, and is well integrated with a wide variety of design creation environments," said Kevin Meyer, vice president of worldwide marketing and services at Chartered. "Mentor's Calibre is already an important part of the leading-edge design ecosystem for many companies today, and our joint efforts ensure that they have access to the proven design and manufacturing technologies needed for first-pass silicon success at 90nm."

"We're expanding the Calibre design-to-silicon platform to answer the trends spurred by new design flows and manufacturing requirements at 90nm," said Joe Sawicki, vice president and general manager, Design-to-Silicon Division, Mentor Graphics. "For example, the latest addition to the Calibre design-to-silicon platform, Calibre xRC, addresses the need for rapid, high-capacity, transistor-level parasitic extraction to enable more accurate post-layout analysis and ensure first-pass silicon success. Our work with Chartered enables companies to apply these capabilities to their leading-edge designs with Chartered's 90nm process."

With today's announcement, Mentor Graphics becomes an inaugural member of Chartered's NanoAccess Alliance and joins the extensive system of industry-leading library, electronic design automation, intellectual property, and outsourced design and manufacturing services companies. The NanoAccess Alliance brings together critical SoC technologies and services with Chartered's NanoAccess semiconductor manufacturing processes for 90nm and beyond. Chartered and the NanoAccess Alliance companies promote access to open design solutions that allow foundry customers more control over their leading-edge design and manufacturing options. (See September 18, 2003 press release, "Chartered Launches NanoAccess Alliance to Enable Chip Design on Foundry-Proven 90nm Process Platform").

The Calibre Design-to-Silicon Platform

In nanometer design, the handoff between IC layout and manufacturing has changed. In previous technologies, the handoff was a simple DRC/LVS check at tapeout. Now it is a multi-step process where the layout database is modified so the design can be manufactured. This presents a host of challenges. Issues arise concerning process effects, photolithography, data volumes and acceptable yield.

To meet these challenges, design teams rely on the integrated Calibre design-to-silicon platform, which includes physical verification, full-chip, transistor-level parasitic extraction, design for manufacturability (DFM), mask data preparation (MDP), optical proximity correction (OPC) and resolution enhancement technologies (RET).

The Calibre design-to-silicon platform of integrated tools is recognized as an industry-leading solution that addresses the complexities of advanced IC design.

Availability

Calibre DRC and Calibre LVS (layout vs. schematic) technology files for Chartered's 90-nm process are available now from Chartered. Calibre xRC (parasitic extraction) files will be available in Q4 2003.

About Mentor Graphics

Mentor Graphics Corporation (Nasdaq:MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $650 million and employs approximately 3,500 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777; Silicon Valley headquarters are located at 1001 Ridder Park Drive, San Jose, California 95131-2314. World Wide Web site: www.mentor.com.

About Chartered

Chartered Semiconductor Manufacturing, one of the world's top three dedicated semiconductor foundries, is forging a customized approach to outsourced semiconductor manufacturing by building lasting and collaborative partnerships with its customers. The Company provides flexible and cost-effective manufacturing solutions for customers, enabling the convergence of communications, computing and consumer markets. In Singapore, Chartered operates five fabrication facilities and has a sixth fab, which will be developed as a 300mm facility.

A company with both global presence and perspective, Chartered is traded on both the Nasdaq Stock Market (Nasdaq:CHRT) and on the Singapore Exchange (SGX-ST: CHARTERED). Chartered's 3,500 employees are based at 11 locations around the world. Information about Chartered can be found at www.charteredsemi.com.

Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation. NanoAccess is a trademark of Chartered Semiconductor Manufacturing. All other company or product names are the registered trademarks or trademarks of their respective owners.

Chartered Safe Harbor Statement under the provisions of the United States Private Securities Litigation Reform Act of 1995

This news release may contain forward-looking statements, as defined in the safe harbor provisions of the U.S. Private Securities Litigation Reform Act of 1995. These forward-looking statements are subject to certain risks and uncertainties, which could cause actual results to differ materially. Among the factors that could cause actual results to differ materially are : the difficulties, interruptions or unforeseen delays in the implementation of our collaborative efforts with Mentor Graphics; changes in market outlook and trends; customer demands; rate of semiconductor market recovery; economic conditions in the United States as well as globally; the performance level of and technology mix in our fabrication facilities and competition. Although we believe the expectations reflected in such forward-looking statements are based upon reasonable assumptions, we can give no assurance that our expectations will be attained. In addition to the foregoing factors, a description of certain other risks and uncertainties which could cause actual results to differ materially can be found in the section captioned "Risk Factors" in our Annual Report on Form 20-F and our First Quarter 2003 Quarterly Report on Form 6-K filed with the U.S. Securities and Exchange Commission. You are cautioned not to place undue reliance on these forward-looking statements, which are based on the current view of management on future events. We undertake no obligation to publicly update or revise any forward-looking statements, whether as a result of new information, future events or otherwise.

CONTACT: Mentor Graphics
             Nan Devlin, 503-685-1809
             nan_devlin@mentor.com
             or
             For Chartered:
             Wired Island, Ltd.
             Laurie Stanley, 510-656-0999
             laurie@wiredislandpr.com